Low loss intersection of Si photonic wire waveguides

被引：116

作者：

Fukazawa, T ^{[1
]}

Hirano, T ^{[1
]}

Ohno, F ^{[1
]}

Baba, T ^{[1
]}

机构：

[1] Yokohama Natl Univ, Dept Elect & Comp Engn, Hodogaya Ku, Yokohama, Kanagawa 2408501, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2004年 / 43卷 / 02期

关键词：

Si photonics; integrated optics; optical circuit; optical waveguide; intersection; photonic wire; SOI;

D O I：

10.1143/JJAP.43.646

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We fabricated a low loss elliptical intersection of Si photonic wire waveguides on a silicon-on-insulator substrate. An insertion loss of less than 0.1 dB was achieved at a wavelength of 1.55 mum. The experimental loss characteristic closely agreed with the theoretical one. We also used this intersection as a suspension of an air-bridge-type waveguide and evaluated a low loss characteristic similar to that mentioned above.

引用

页码：646 / 647

页数：2

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