Bandgap Engineering of Strained Monolayer and Bilayer MoS2

被引:2150
作者
Conley, Hiram J. [1 ]
Wang, Bin [1 ]
Ziegler, Jed I. [1 ]
Haglund, Richard F., Jr. [1 ]
Pantelides, Sokrates T. [1 ,2 ]
Bolotin, Kirill I. [1 ]
机构
[1] Vanderbilt Univ, Dept Phys & Astron, Nashville, TN 37235 USA
[2] Oak Ridge Natl Lab, Div Mat Sci & Technol, Oak Ridge, TN 37831 USA
基金
美国国家科学基金会;
关键词
MoS2; strain; bandgap engineering; photoluminescence; Gruneisen parameter; VALLEY POLARIZATION; ELECTRICAL CONTROL;
D O I
10.1021/nl4014748
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report the influence of uniaxial tensile mechanical strain in the range 0-2.2% on the phonon spectra and bandstructures of monolayer and bilayer molybdenum disulfide (MoS2) two-dimensional crystals. First, we employ Raman spectroscopy to observe phonon softening with increased strain, breaking the degeneracy in the E' Raman mode of MoS2, and extract a Gruneisen parameter of similar to 1.06. Second, using photoluminescence spectroscopy we measure a decrease in the optical band gap of MoS2 that is approximately linear with strain, similar to 45 meV/% strain for monolayer MoS2 and similar to 120 meV/% strain for bilayer MoS2. Third, we observe a pronounced strain-induced decrease in the photoluminescence intensity of monolayer MoS2 that is indicative of the direct-to-indirect transition of the character of the optical band gap of this material at applied strain of similar to 1%. These observations constitute a demonstration of strain engineering the band structure in the emergent class of two-dimensional crystals, transition-metal dichalcogenides.
引用
收藏
页码:3626 / 3630
页数:5
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