Ion beam deposition and structural characterization of GMR spin valves

被引:18
作者
Wang, SX [1 ]
Bailey, WE [1 ]
Surgers, C [1 ]
机构
[1] STANFORD UNIV,DEPT ELECT ENGN,SOLID STATE LAB,STANFORD,CA 94305
关键词
ion-beam applications; magnetic recording/reading heads; magnetoresistive materials/devices;
D O I
10.1109/20.573860
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
NiO exchange-biased ''bottom'' spin valves of the type NiO/NiFe/Co/Cu/Co/NiFe and FeMn exchange-biased ''top'' spin valves of the type NiFe/Co/Cu/Co/NiFe/FeMn were deposited by ion-beam deposition (except the NiO layer). Their magnetic properties, magneto-transport, and microstructures are characterized and compared with corresponding GMR spin valves deposited by de magnetron sputtering, High-resolution cross-sectional transmission electron microscopy and X-ray diffraction reveal microstructural differences between ion-beam-deposited and de magnetron sputtered spin valves. In particular, film texture, surface morphology, GMR ratio, exchange bias, interlayer coupling strength, and coercivity vary widely, but property-structure-processing correlation can be identified, A GMR ratio of similar to 9.7% was obtained on random textured NiO exchange-biased bottom spin valves by ion-beam deposition.
引用
收藏
页码:2369 / 2374
页数:6
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