Synthesis of phosphorus-carbide thin films by magnetron sputtering

被引：42

作者：

Furlan, A. ^{[1
]}

Gueorguiev, G. K. ^{[1
]}

Czigany, Zs. ^{[2
]}

Hogberg, H. ^{[1
]}

Braun, S. ^{[1
]}

Stafstrom, S. ^{[1
]}

Hultman, L. ^{[1
]}

机构：

[1] Linkoping Univ IFM, Thin Film Phys Div, S-58183 Linkoping, Sweden

[2] Res Inst Tech Phys & Mat Sci, H-1525 Budapest, Hungary

来源：

PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS | 2008年 / 2卷 / 04期

基金：

瑞典研究理事会;

关键词：

D O I：

10.1002/pssr.200802077

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Phosphorus-carbide, CPx (0.025 <= x <= 0.1), thin films have been synthesized by magnetron sputtering from pressed graphite-phosphorus targets. The films were characterized by X-ray photoelectron spectroscopy, transmission electron microscopy and diffraction, and nanoindentation. CP0.1 exhibits C-P bonding in an amorphous structure with elements of curved graphene planes, yielding a material with unique short range order. These features are consistent with what has been predicted by our results of theoretically modeled synthetic growth of CPx. The films are mechanically resilient with hardness up to 24 GPa and elastic recovery up to 72%. (c) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

引用

页码：191 / 193

页数：3

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