Fullerene-like carbon nitride:: A resilient coating material

被引:110
作者
Hultman, L [1 ]
Neidhardt, J
Hellgren, N
Sjöström, H
Sundgren, JE
机构
[1] Linkoping Univ, Thin Film Phys Div, S-58183 Linkoping, Sweden
[2] Univ Illinois, Chicago, IL 60680 USA
[3] Sjostrom Coating Consulting, Gothenburg, Sweden
[4] Chalmers, S-41296 Gothenburg, Sweden
关键词
carbon nitride; fullerene-related materials; superhard coating materials; thin films;
D O I
10.1557/mrs2003.62
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nitride is an emerging material for wear-resistant coatings. The fullerene-like CNx compounds generally exhibit extreme elasticity in combination with a low work of indentation hardness. Yet CNx shows a low-to-moderate resistance to penetration, depending on deposition conditions. Since the deformation energy is predominantly stored elastically, the material possesses an extremely resilient character. This new class of materials consists of sp(2)-coordinated basal planes that are buckled from the incorporation of-pentagons and cross-linked at sp(3)-hybridized C sites, both of which are caused by structural incorporation of nitrogen. Carbon nitride thus deforms elastically due to bending of the structural units. The orientation, radius of curvature of the basal planes, and the degree of cross-linking between them defines the structure and properties of the material. Due to the unique deformation behavior, the hardness requires special care to assess, but can be very high for films with a large degree of cross-linking. This article is a review of the research on CNx films deposited by reactive magnetron sputtering, with examples from our recent work. The findings are significant for the design of fracture-tough materials.
引用
收藏
页码:194 / 202
页数:9
相关论文
共 86 条
  • [1] Carbon films with an sp2 network structure
    Alexandrou, I
    Scheibe, HJ
    Kiely, CJ
    Papworth, AJ
    Amaratunga, GAJ
    Schultrich, B
    [J]. PHYSICAL REVIEW B, 1999, 60 (15): : 10903 - 10907
  • [2] Hard elastic carbon thin films from linking of carbon nanoparticles
    Amaratunga, GAJ
    Chhowalla, M
    Kiely, CJ
    Alexandrou, I
    Aharonov, R
    Devenish, RM
    [J]. NATURE, 1996, 383 (6598) : 321 - 323
  • [3] A new fullerene-like inorganic compound fabricated by the sonolysis of an aqueous solution of TlCl3
    Avivi, S
    Mastai, Y
    Gedanken, A
    [J]. JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2000, 122 (18) : 4331 - 4334
  • [4] Silicon carbonitride: a rival to cubic boron nitride
    Badzian, A
    Badzian, T
    Drawl, WD
    Roy, R
    [J]. DIAMOND AND RELATED MATERIALS, 1998, 7 (10) : 1519 - 1525
  • [5] Beamson G., 1992, ADV MATER, DOI DOI 10.1002/ADMA.19930051035
  • [6] ENERGETIC FULLERENE INTERACTIONS WITH SI CRYSTAL-SURFACES
    BEARDMORE, K
    SMITH, R
    WEBB, RP
    [J]. MODELLING AND SIMULATION IN MATERIALS SCIENCE AND ENGINEERING, 1994, 2 (03) : 313 - 328
  • [7] Microstructure, mechanical properties, and wetting behavior of Si-C-N thin films grown by reactive magnetron sputtering
    Berlind, T
    Hellgren, N
    Johansson, MP
    Hultman, L
    [J]. SURFACE & COATINGS TECHNOLOGY, 2001, 141 (2-3) : 145 - 155
  • [8] BERLIND T, 2000, THESIS LINKOPING STU
  • [9] Ultra-thin overcoats for the head/disk interface tribology
    Bhatia, CS
    Anders, S
    Brown, IG
    Bobb, K
    Hsiao, R
    Bogy, DB
    [J]. JOURNAL OF TRIBOLOGY-TRANSACTIONS OF THE ASME, 1998, 120 (04): : 795 - 799
  • [10] Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content
    Broitman, E
    Hellgren, N
    Neidhardt, J
    Brunell, I
    Hultman, L
    [J]. JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (09) : L11 - L15