High-pressure torsion-induced grain growth in electrodeposited nanocrystalline Ni

被引:201
作者
Liao, XZ
Kilmametov, AR
Valiev, RZ
Gao, HS
Li, XD
Mukherjee, AK
Bingert, JF
Zhu, YT
机构
[1] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
[2] Univ Chicago, James Franck Inst, Chicago, IL 60637 USA
[3] Ufa State Aviat Tech Univ, Inst Phys Adv Mat, Ufa 450000, Russia
[4] Univ S Carolina, Dept Mech Engn, Columbia, SC 29208 USA
[5] Univ Calif Davis, Dept Chem Engn & Mat Sci, Davis, CA 95616 USA
关键词
D O I
10.1063/1.2159088
中图分类号
O59 [应用物理学];
学科分类号
摘要
Deformation-induced grain growth has been reported in nanocrystalline (nc) materials under indentation and severe cyclic loading, but not under any other deformation mode. This raises an issue on critical conditions for grain growth in nc materials. This study investigates deformation-induced grain growth in electrodeposited nc Ni during high-pressure torsion (HPT). Our results indicate that high stress and severe plastic deformation are required for inducing grain growth, and the upper limit of grain size is determined by the deformation mode and parameters. Also, texture evolution suggests that grain-boundary-mediated mechanisms played a significant role in accommodating HPT strain. (c) 2006 American Institute of Physics.
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页码:1 / 3
页数:3
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