A method to extract mobility degradation and total series resistance of fully-depleted SOI MOSFETs

被引:16
作者
Sánchez, FJG
Ortiz-Conde, A
Cerdeira, A
Estrada, M
Flandre, D
Liou, JJ
机构
[1] Univ Simon Bolivar, LEES, Caracas 1080A, Venezuela
[2] IPN, CINVESTAV, Dept Ingn Elect, SEES, Mexico City 07300, DF, Mexico
[3] Univ Catholique Louvain, Microelect Lab, B-1348 Louvain, Belgium
[4] Univ Cent Florida, Sch Elect Engn & Comp Sci, Orlando, FL 32816 USA
[5] Huazhong Univ Sci & Technol, Dept Elect Sci & Technol, Wuhan 430074, Peoples R China
关键词
mobility degradation; parameter extraction; series resistance; SOI MOSFETs; threshold voltage; velocity saturation;
D O I
10.1109/16.974753
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Free-carrier mobility degradation in the channel and drain/source series resistance are two important parameters limiting the performance of MOS devices. In this paper, we present a method to extract these parameters from the drain current versus gate voltage characteristics of fully-depleted (FD) SOI MOSFETs operating in the saturation region. This method is developed based on an integration function which reduces errors associated with the extraction procedure and on the d.c. characteristics of MOS devices having several different channel lengths. Simulation results and measured data of FD SOI MOSFETs are used to test and verify the method developed.
引用
收藏
页码:82 / 88
页数:7
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