Device parameter extraction in the linear region of MOSFET's

被引:24
作者
Katto, H
机构
[1] Department of Electrical Engineering, Science University of Tokyo, Suwa College
关键词
D O I
10.1109/55.622512
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A self-consistent technique is proposed to extract device parameters from the I-V characteristics of MOSFET's in the linear region. The three parameters V-T, B-m (= beta(0)) and R-m are extracted from the implicitly weighed least square curve fitting of r(D) against 1/(V-G - V-T - alpha V-D). The series resistance R, the factor theta of the V-G dependent beta, and L-eff are then obtained by comparing the long and short channel devices. Reasonable values are obtained for five technologies, and general agreement with Taur's method is confirmed. Based on the finding, a quick parameter extraction method using only three {r(D), V-G} data sets is proposed.
引用
收藏
页码:408 / 410
页数:3
相关论文
共 7 条
[1]   The impact of device scaling and power supply change on CMOS gate performance [J].
Chen, K ;
Wann, HC ;
Ko, PK ;
Hu, CM .
IEEE ELECTRON DEVICE LETTERS, 1996, 17 (05) :202-204
[2]  
JAIN S, 1988, P I ELECTR ENG, V135, P162
[3]   PARAMETER EXTRACTION FROM IV CHARACTERISTICS OF SINGLE MOSFETS [J].
SELMI, L ;
SANGIORGI, E ;
RICCO, B .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (06) :1094-1101
[4]   EXPERIMENTAL DERIVATION OF THE SOURCE AND DRAIN RESISTANCE OF MOS-TRANSISTORS [J].
SUCIU, PI ;
JOHNSTON, RL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (09) :1846-1848
[5]   ELECTRON-MOBILITY IN INVERSION AND ACCUMULATION LAYERS ON THERMALLY OXIDIZED SILICON SURFACES [J].
SUN, SC ;
PLUMMER, JD .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1980, 15 (04) :562-573
[6]   A NEW SHIFT AND RATIO METHOD FOR MOSFET CHANNEL-LENGTH EXTRACTION [J].
TAUR, Y ;
ZICHERMAN, DS ;
LOMBARDI, DR ;
RESTLE, PJ ;
HSU, CH ;
HANAFI, HI ;
WORDEMAN, MR ;
DAVARI, B ;
SHAHIDI, GG .
IEEE ELECTRON DEVICE LETTERS, 1992, 13 (05) :267-269
[7]   NEW METHOD TO DETERMINE EFFECTIVE MOSFET CHANNEL LENGTH [J].
TERADA, K ;
MUTA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1979, 18 (05) :953-959