Nanoindentation and nanoscratching studies of amorphous carbon films

被引：53

作者：

Charitidis, C ^{[1
]}

Logothetidis, S ^{[1
]}

Douka, P ^{[1
]}

机构：

[1] Aristotelian Univ Salonika, Dept Phys, GR-54006 Salonika, Greece

来源：

关键词：

amorphous carbon; hardness; mechanical properties; sputtering;

D O I：

10.1016/S0925-9635(98)00285-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Hydrogen-free amorphous carbon (a-C) films prepared by RF magnetron sputtering were deposited on Si substrates in thin films, at various negative bias voltages V-b, (i.e. Ar-ion energies), and in thick layered-structure films with alternative values of V-b. The main purposes of this work are to present preliminary results concerning the effect of Ar-ion bombardment during deposition on the elastic properties of thin a-C films with Ar+ energies in the range 30-200 eV, and the adhesion failure which limits their thickness and usefulness for practical applications, and the enhancement of hardness and scratch resistance of sputtered a-C films developed in a layered structure. The results show a significant improvement in the elastic properties of layered structure films and their stability. The combination of high hardness and relative low elastic modulus which the layered films exhibit make them more resistant to plastic deformation during contact, as confirmed by scratch testing. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：558 / 562

页数：5

共 19 条

[1] A SIMPLE-MODEL FOR THE FORMATION OF COMPRESSIVE STRESS IN THIN-FILMS BY ION-BOMBARDMENT [J].

DAVIS, CA .

THIN SOLID FILMS, 1993, 226 (01) :30-34

[2] The effect of substrate bias in amorphous carbon films prepared by magnetron sputtering and monitored by in-situ spectroscopic ellipsometry [J].

Gioti, M ;

Logothetidis, S .

[3] Stress relaxation and stability in thick amorphous carbon films deposited in layer structure [J].

Gioti, M ;

Logothetidis, S ;

Charitidis, C .

APPLIED PHYSICS LETTERS, 1998, 73 (02) :184-186

[4]

Johnson K. L., 1985, CONTACT MECH, P155

[5]

KISLY PS, 1984, P INT C SCI HARD MAT

[6] Nanoindentation measurements of amorphous carbon coatings [J].

Kulkarni, AV ;

Bhushan, B .

JOURNAL OF MATERIALS RESEARCH, 1997, 12 (10) :2707-2714

[7] SUBSTANTIATION OF SUBPLANTATION MODEL FOR DIAMOND-LIKE FILM GROWTH BY ATOMIC-FORCE MICROSCOPY [J].

LIFSHITZ, Y ;

LEMPERT, GD ;

GROSSMAN, E .

PHYSICAL REVIEW LETTERS, 1994, 72 (17) :2753-2756

[8] Amorphous carbon films rich in diamond deposited by magnetron sputtering [J].

Logothetidis, S ;

Gioti, M .

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1997, 46 (1-3) :119-123

[9] Hydrogen-free amorphous carbon films approaching diamond prepared by magnetron sputtering [J].

Logothetidis, S .

APPLIED PHYSICS LETTERS, 1996, 69 (02) :158-160

[10] Studies of density and surface roughness of ultrathin amorphous carbon films with regards to thickness with x-ray reflectometry and spectroscopic ellipsometry [J].

Logothetidis, S ;

Stergioudis, G .

APPLIED PHYSICS LETTERS, 1997, 71 (17) :2463-2465

← 1 2 →