Models for adatom diffusion on fcc (001) metal surfaces

被引:65
作者
Mehl, H [1 ]
Biham, O
Furman, I
Karimi, M
机构
[1] Hebrew Univ Jerusalem, Racah Inst Phys, IL-91904 Jerusalem, Israel
[2] Indiana Univ Penn, Dept Phys, Indiana, PA 15705 USA
来源
PHYSICAL REVIEW B | 1999年 / 60卷 / 03期
关键词
D O I
10.1103/PhysRevB.60.2106
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present a class of models that describe self-diffusion on fee (001) metal substrates within a common framework. The models are tested far Cu(001), Ag(001), Au(001),Ni(001), and Pd(001), and found to apply well for all of them. For each of these metals the models can be used to estimate the activation energy of any diffusion process using a few basic parameters that may be obtained from experiments, ab initio or semiempirical calculations. To demonstrate the approach, the parameters of the models are optimized to describe self-diffusion on the (001) surface, by comparing the energy barriers to a full set of barriers obtained from semiempirical potentials via the embedded atom method (EAM). It is found that these models with at most four parameters, provide a good description of the full landscape of hopping energy barriers on fee (001) surfaces. The main features of the diffusion processes revealed by EAM calculations are quantitatively reproducible by the models. [S0163-1829(99)01227-8].
引用
收藏
页码:2106 / 2116
页数:11
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