Positive ions in RF discharge plasma of CF4 gas in a planar diode

被引：8

作者：

Ishikawa, I ^{[1
]}

Sasaki, S ^{[1
]}

Nagaseki, K ^{[1
]}

Saito, Y ^{[1
]}

Suganomata, S ^{[1
]}

机构：

[1] TOKYO ELECTRON YAMANASHI LTD,NIRASAKI 407,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 07期

关键词：

CF4; gas; positive ion; CFx+; mass spectrometry; RF discharge; plasma;

D O I：

10.1143/JJAP.35.4081

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Positive ions were measured an situ by direct sampling from CF4 discharge space at 13.56 MHz using a quadrupole mass spectrometer. CF3+ is observed predominantly with smaller amounts of CF2+ and CF+. With increasing RF power, both CF2+ and CF+ shift to the lower energy side of CF3+, and their intensities tend to increase. Such a phenomenon is also observed as controlling the potential of a sampling tip externally. These seem to suggest that CF2+ and CF+ are produced mainly in the sheath region.

引用

页码：4081 / 4082

页数：2

共 4 条

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NAGASEKI, K ;

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