MASS-SPECTROMETRY OF DISCHARGE PRODUCTS AT 13.56-MHZ IN SF6 GAS

被引：25

作者：

NAGASEKI, K ^{[1
]}

KOBAYASHI, H ^{[1
]}

ISHIKAWA, I ^{[1
]}

NISHIMURA, E ^{[1
]}

SAITO, Y ^{[1
]}

SUGANOMATA, S ^{[1
]}

机构：

[1] TOKYO ELECTRON YAMANASHI LTD,DEV ENGN GRP,NIRASAKI 407,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7B期

关键词：

SF6; GAS; MASS SPECTROMETRY; FRAGMENTATION; SFX SPECIES; SFX+ ION SPECIES; 13.56 MHZ DISCHARGE; ETCHING PLASMA;

D O I：

10.1143/JJAP.33.4348

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Discharge products in SF6 RF plasma were measured by means of direct sampling using a quadrupole mass spectrometer. In the plasma, the neutral dissociative species SF2 and SF4 are present. The positive ion SF3+ is predominant, and SF5+, SF2+, SF+ and F+ are also present. The concentration of each neutral and ion product depends on RF power, gas flow rate and area of the silicon wafer set on the grounded electrode. When SF, SF2, SF+ and SF2+ increase to certain amounts, S2F+, SF2+ and S+ can be observed.

引用

页码：4348 / 4352

页数：5

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