A MASS-SPECTROMETRIC STUDY OF POSITIVE AND NEGATIVE-ION FORMATION IN AN SF6 CORONA .1. SOURCES OF SULFUR-FLUORIDE IONS

被引:47
作者
SAUERS, I
HARMAN, G
机构
[1] Hearth and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, TN
关键词
D O I
10.1088/0022-3727/25/5/005
中图分类号
O59 [应用物理学];
学科分类号
摘要
The mass spectra of positive ions generated in a positive high-voltage point-to-plane corona and negative ions generated in a negative high-voltage point-to-plane corona in high-purity SF6 are reported. In the absence of added impurities the major positively- and negatively-charged ions are SF5+, SF3+, SF2+ SF+, SF6-, SF5- and F-. Evidence for the formation of SF6 corona discharge neutral by-products, SF4 and SF2, is observed from the presence of cluster ions. SF(x)+ (SF4) and SF(x)+ (SF2), x = 2, 3. Based on analyses of predicted ion intensities from cross-section data, SF2+ and SF+ ions are attributed to SF2 in the discharge, while most of the SF3+ observed is attributed to SF4. In the case of negative ions, analyses indicate that F- is formed in the discharge at high-density normalized electric field, E/N, from both dissociative attachment of SF6 and ion conversion processes, while SF6- and SF5- are likely to be formed outside the glow. Other ions observed resulting from the presence of trace contaminants include SOF3+, SOF2+, SOF+, SOF5- and F-(HF)2. In this paper (part I) the various sources of ions produced in 'pure' SF6 Corona are discussed while in part II the effects of water and SF6 neutral corona by-products on ion formation are discussed.
引用
收藏
页码:761 / 773
页数:13
相关论文
共 46 条
[1]   MASS-SPECTRAL INTENSITIES OF INORGANIC FLUORINE-CONTAINING COMPOUNDS [J].
BEATTIE, WH .
APPLIED SPECTROSCOPY, 1975, 29 (04) :334-337
[2]   DRIFT VELOCITIES OF POSITIVE-IONS AND NEGATIVE-IONS IN CYLINDER SF6 [J].
BLAIR, DTA ;
CRICHTON, BH ;
ALKINDI, FJ ;
SHARMA, TL .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1989, 22 (06) :755-758
[3]   THE INTERACTION POTENTIALS OF SF6 IONS IN SF6 PARENT GAS DETERMINED FROM MOBILITY DATA [J].
BRAND, KP ;
JUNGBLUT, H .
JOURNAL OF CHEMICAL PHYSICS, 1983, 78 (04) :1999-2007
[4]  
BRAND WW, 1988, J APPL PHYS, V60, P1595
[5]  
CHASE MW, 1985, J PHYS CHEM REF DA S, V14
[6]  
CHRISTOPHOROU LG, 1984, ELECTRON MOL INTERAC, V1, P47
[7]   PLASMA-ETCHING OF SI AND SIO2 IN SF6-O2 MIXTURES [J].
DAGOSTINO, R ;
FLAMM, DL .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :162-167
[8]  
DEURQUIJO J, 1990, NONEQUILIBRIUM EFFECTS IN ION AND ELECTRON TRANSPORT, P211
[9]   IONIZATION CROSS-SECTIONS OF GAS MOLECULES FOR PLASMA CHEMISTRY [J].
DEUTSCH, H ;
SCHMIDT, M .
CONTRIBUTIONS TO PLASMA PHYSICS, 1985, 25 (05) :475-484
[10]   DISSOCIATION OF SF6, CF4, AND SIF4 BY ELECTRON IMPACT [J].
DIBELER, VH ;
MOHLER, FL .
JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1948, 40 (01) :25-29