Resonant enhancement of emission and absorption using frequency selective surfaces in the infrared

被引：22

作者：

Puscasu, I

Schaich, W

Boreman, GD

机构：

[1] Univ Cent Florida, CREOL, Sch Opt, Orlando, FL 32816 USA

[2] Indiana Univ, Dept Phys, Bloomington, IN 47405 USA

来源：

INFRARED PHYSICS & TECHNOLOGY | 2002年 / 43卷 / 02期

关键词：

frequency selective surfaces; absorption; infrared;

D O I：

10.1016/S1350-4495(01)00134-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We investigate the infrared properties of frequency selective surfaces consisting of aluminum patches on silicon substrates. Resonant behavior is found not only in the transmission and reflection, but also in the absorption and emission of these surfaces. The resonance location is a controllable function of the surface pattern. Simple model calculations reproduce well the qualitative behavior of our samples. (C) 2002 Elsevier Science B.V. All rights reserved.

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页码：101 / 107

页数：7

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