Improved structural properties and surface morphology of Nd1+xBa2-xCu3O7-δ thin films deposited by d.c. magnetron sputtering

被引:10
作者
Salluzzo, M [1 ]
Maggio-Aprile, I
Fischer, O
机构
[1] Univ Naples Federico II, INFM, I-80125 Naples, Italy
[2] Univ Naples Federico II, Dept Phys, I-80125 Naples, Italy
[3] Univ Geneva, Dept Phys, CH-1211 Geneva, Switzerland
关键词
D O I
10.1109/77.784819
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the fabrication of very smooth NdBCO thin films deposited by d.c. magnetron sputtering using Nd rich target (EDS composition Nd1.12BaL88CU3O7-delta). Films characterized by critical temperature (R=0) higher than 90 Ii and maximum roughness lower than 2-3 nm on large areas are routinely obtained on SrTiO3 non-vicinal substrates. STM studies performed in situ in UHV environment, show a 2D nucleation mechanism of the growth preserved up to a thickness higher than 100 nm. This is in contrast to the common observation of screw dislocations starting from 10-12 nm in c-asis ReBCO thin films, that gives rise to an increase of the roughness with thickness. We compare the growth modes, the superconducting, and the structural properties of our NdBCO thin films deposited by d.c. magnetron sputtering from stoichiometric and Nd-rich targets, on different kind of substrates. The experimental results are discussed in the framework of the role of Nd/Ba substitution in the properties of Nd1+xBa2-xCu3O7-delta thin films.
引用
收藏
页码:1856 / 1859
页数:4
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