Beam-induced damage to thin specimens in an intense electron probe

被引：97

作者：

Egerton, RF ^{[1
]}

Wang, F

Crozier, PA

机构：

[1] Univ Alberta, Phys Dept, Edmonton, AB T6G 2J1, Canada

[2] Arizona State Univ, Ctr Solid State Sci, Tempe, AZ 85287 USA

来源：

MICROSCOPY AND MICROANALYSIS | 2006年 / 12卷 / 01期

关键词：

radiation damage; electron sputtering; aberration-corrected probe;

D O I：

10.1017/S1431927606060065

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have investigated the changes produced in single-element and two-layer transmission electron microscope (TEM) specimens irradiated by an intense nanometer-sized electron probe, Such as that produced in a field-emission or aberration-corrected TEM. These changes include hole formation and the accumulation of material within the irradiated area. The results are discussed in terms of mechanisms, including electron-beam sputtering and surface diffusion. Strategies for minimizing the effect of the beam are considered.

引用

页码：65 / 71

页数：7

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