Beam-induced damage to thin specimens in an intense electron probe

被引:97
作者
Egerton, RF [1 ]
Wang, F
Crozier, PA
机构
[1] Univ Alberta, Phys Dept, Edmonton, AB T6G 2J1, Canada
[2] Arizona State Univ, Ctr Solid State Sci, Tempe, AZ 85287 USA
关键词
radiation damage; electron sputtering; aberration-corrected probe;
D O I
10.1017/S1431927606060065
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the changes produced in single-element and two-layer transmission electron microscope (TEM) specimens irradiated by an intense nanometer-sized electron probe, Such as that produced in a field-emission or aberration-corrected TEM. These changes include hole formation and the accumulation of material within the irradiated area. The results are discussed in terms of mechanisms, including electron-beam sputtering and surface diffusion. Strategies for minimizing the effect of the beam are considered.
引用
收藏
页码:65 / 71
页数:7
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