High performance 0.25μm gate-length AlGaN/GaN HEMTs on sapphire with transconductance of over 400 mS/mm

被引:15
作者
Kumar, V
Lu, W
Khan, FA
Schwindt, R
Kuliev, A
Simin, G
Yang, J
Khan, MA
Adesida, I
机构
[1] Univ Illinois, Dept Elect & Comp Engn, Microelect Lab, Urbana, IL 61801 USA
[2] Univ S Carolina, Dept Elect & Comp Engn, Columbia, SC 29208 USA
关键词
D O I
10.1049/el:20020178
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metal organic chemical vapour deposition-grown AlGaN/GaN high electron mobility transistors (HEMTs) having record high transconductance of over 400 mS/mm have been fabricated on sapphire substrates. These 0.25 mum gate-length devices exhibited maximum drain current density as high as 1.4 A/mm, unity gain cutoff frequency m 5 (f(T)) of 85 GHz, and maximum frequency of oscillation (f(max)) of 151 GHz. The f(T) of 85 GHz and f(max) of 151 GHz are the highest ever reported values for 0.25 tun gate-length GaN-based HEMTs.
引用
收藏
页码:252 / 253
页数:2
相关论文
共 6 条
[1]   0.25 μm gate-length, MBE-grown AlGaN/GaN HEMTs with high current and high fT [J].
Kumar, V ;
Lu, W ;
Schwindt, R ;
Van Hove, J ;
Chow, P ;
Adesida, I .
ELECTRONICS LETTERS, 2001, 37 (13) :858-859
[2]   GaN/AlGaN high electron mobility transistors with fτ of 110GHz [J].
Micovic, M ;
Nguven, NX ;
Janke, P ;
Wong, WS ;
Hashimoto, P ;
McCray, LM ;
Nguyen, C .
ELECTRONICS LETTERS, 2000, 36 (04) :358-359
[3]   High performance microwave power GaN/AlGaN MODFETs grown by RF-assisted MBE [J].
Nguyen, NX ;
Micovic, M ;
Wong, WS ;
Hashimoto, P ;
McCray, LM ;
Janke, P ;
Nguyen, C .
ELECTRONICS LETTERS, 2000, 36 (05) :468-469
[4]  
SANDHU R, 2001, IEDM, P940
[5]   High-power microwave GaN/AlGaN HEMT's on semi-insulating silicon carbide substrates [J].
Sheppard, ST ;
Doverspike, K ;
Pribble, WL ;
Allen, ST ;
Palmour, JW ;
Kehias, LT ;
Jenkins, TJ .
IEEE ELECTRON DEVICE LETTERS, 1999, 20 (04) :161-163
[6]  
WU YF, 1999, IEDM, P927