Evidence of momentum conservation at a nonepitaxial metal/semiconductor interface using ballistic electron emission microscopy

被引:80
作者
Bell, LD
机构
[1] Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena, CA
关键词
D O I
10.1103/PhysRevLett.77.3893
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Ballistic-electron-emission microscopy (BEEM) spectroscopy has been performed on Au/Si(111) structures as a function of Au thickness and temperature. At 77 K a direct signature of parallel momentum conservation at the Au/Si interface is observed in the BEEM spectra. The variation in spectral shape with both Au thickness and temperature places restrictions on allowable values of inelastic and elastic mean-free paths in the metal, and also requires the presence of multiple electron passes within the Au layer. An independent indication of multiple reflections is directly observed in the attenuation of BEEM current with Au thickness.
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页码:3893 / 3896
页数:4
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