First demonstration of rectifying property of p-i-n heterojunctions fabricated by tri-layered semiconducting oxides

被引:101
作者
Sugiura, M [1 ]
Uragou, K [1 ]
Noda, M [1 ]
Tachiki, M [1 ]
Kobayashi, T [1 ]
机构
[1] Osaka Univ, Fac Engn Sci, Dept Elect Engn, Toyonaka, Osaka 560, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 4B期
关键词
oxide semiconductor; La0.85Sr0.15MnO3; SrTiO3; La0.05Sr0.95TiO3; epitaxial film; p-i-n diode; heterojunction; rectifying property; active oxide devices;
D O I
10.1143/JJAP.38.2675
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have fabricated semiconducting oxide p-i-n diodes in order to explore minority carrier injection effects in oxide materials. The diodes comprised p-La0.85Sr0.15MnO3/i-SrTiO3/n-La0.05Sr0.95TiO3. All oxide layers were grown epitaxially by the eclipse pulsed laser deposition method on (100) SrTiO3 substrates. The diodes showed good rectifying properties, and from the flat-band capacitance measurement, we obtained a diffusion potential of about 0.2,V for these diodes in agreement with the calculated results. In the lower temperature regime, the space-charge-limited-current property was pronounced, arising from residual traps inside the i-SrTiO3 layer. The backward current was mostly due to tunneling through the i-SrTiO3 layer, showing no meaningful expansion of depletion regions in both p- and n-oxide layers.
引用
收藏
页码:2675 / 2678
页数:4
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