Evaporation of silver during chemical vapor deposition process for YBa2Cu3O7 and its effect on microstructure

被引：6

作者：

Ma, YW ^{[1
]}

Watanabe, K

Awaji, S

Motokawa, M

机构：

[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan

[2] Japan Sci & Technol Corp, CREST, Tsukuba, Ibaraki 3050047, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2001年 / 40卷 / 11期

关键词：

CVD; evaporation of silver; vapor pressure; silver substrate; MgO; morphology change;

D O I：

10.1143/JJAP.40.6339

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

YBa2Cu3O7 (YBCO) films were simultaneously grown on both silver and Mgo substrates by a chemical vapor deposition (CVD) technique. it is found that the transportation of silver occurs through the evaporation of silver from the silver substrate at the processing temperature of 850 degreesC. The effect of the evaporation of silver during deposition was investigated. The silver vapor travels a distance of a few millimeters over the surface of a neighboring MgO substrate. It is also demonstrated for the first time that the presence of silver vapor causes some microstructural changes in the film grown on the MgO substrate.

引用

页码：6339 / 6343

页数：5

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