Integration of polymer and metal microstructures using liquid-phase photopolymerization

被引:28
作者
Agarwal, AK
Beebe, DJ
Jiang, HR
机构
[1] Univ Wisconsin, Dept Elect & Comp Engn, Madison, WI 53706 USA
[2] Univ Wisconsin, Dept Biomed Engn, Madison, WI 53706 USA
关键词
D O I
10.1088/0960-1317/16/2/018
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper we demonstrate, using a fabrication technique, liquid-phase photopolymerization (Lp(3)) for the relatively fast and low-cost integration of thick polymers and electroformed metal microstructures to develop a range of microfluidic components and systems. Liquid-phase UV-photosensitive polymers, similar to negative-tone photoresists, are used to create both polymer microstructures and molds to define electroformed metal (here, nickel-Ni) microstructures. This fabrication process can act as a stand-alone or appended one; it is gentle to allow processing after a metal structure has been released since fabrication occurs only at designated areas on a substrate, i.e. no spinning/casting of photosensitive materials, and self-planarization is achieved since photopolymerization of polymers occurs in the liquid phase. Photopatterned polymer and electroformed Ni microstructures are fabricated using Lp(3) with a low-end (low-cost) lithographic system. A variety of functional microfluidic components and systems, e.g., an active and a passive chaotic micromixer, and gear trains, are fabricated by utilizing a sequential step-and-repeat Lp(3) process to demonstrate the integration of polymers and metals.
引用
收藏
页码:332 / 340
页数:9
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