In situ high-resolution photoelectrochemical imaging of precursor sites for pitting in polycrystalline titanium

被引:28
作者
Garfias-Mesias, LF [1 ]
Smyrl, WH [1 ]
机构
[1] Univ Minnesota, Dept Chem Engn & Mat Sci, Corros Res Ctr, Minneapolis, MN 55455 USA
关键词
D O I
10.1149/1.1391961
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Photoelectrochemical microscopy (PEM) was used to locate pitting precursor sites on polycrystalline titanium immersed in sulfuric acid and in ferrocyanide solutions. PEM imaging was done with both a conventional method and a new shear-force feedback method. The resolution of the PEM images obtained are highly dependent upon the size and preparation procedure of the optical fiber used for the test; 1 mu m diam etched tips yield higher lateral resolution images compared to commercially available "pulled" tips. PEM with simultaneous independent topography (using the tuning fork method) resolved submicron features at precursor sites at inclusions and grain boundaries. Both PEM and topographic images were obtained in situ with high lateral resolution by using specially fabricated tips with 100 nm aperture. (C) 1999 The Electrochemical Society. S0013-4651(98)09-038-7. All rights reserved.
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页码:2495 / 2501
页数:7
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