Zinc oxide thin films prepared by thermal evaporation deposition and its photocatalytic activity

被引：186

作者：

Fouad, OA ^{[1
]}

Ismail, AA ^{[1
]}

Zaki, ZI ^{[1
]}

Mohamed, RM ^{[1
]}

机构：

[1] CMRDI, Cairo 11421, Egypt

来源：

APPLIED CATALYSIS B-ENVIRONMENTAL | 2006年 / 62卷 / 1-2期

关键词：

ZnO thin films; vapor deposition; azo-reactive dye; photocatalytic activity;

D O I：

10.1016/j.apcatb.2005.07.006

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin zinc oxide (ZnO) films have been grown on silicon substrates by thermal physical vapor deposition approach. X-ray diffraction (XRD) analyses reveal that the deposited films are polycrystalline ZnO phase. Atomic force microscopy images (AFM) show needle-like shape highly oriented ZnO crystals. Thin film thickness ranges from 10 to 80 nm. X-ray photoelectron spectroscopy (XPS) results declare that the films compose mainly of Zn and O. Nevertheless, Si is not detected in the films and consequently no possibility of any silicide formation as is confirmed by XRD analysis. Photocatalytic decomposition of azo-reactive dye on ZnO films is tested. The results show that the dye decomposition efficiency increases with decreasing pH. Maximum photodecomposition, 99.6% is obtained at pH 2 with 10 mg/l dye concentration. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：144 / 149

页数：6

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