A few electrons per ion scenario for the B=0 metal-insulator transition in two dimensions

被引:41
作者
Klapwijk, TM [1 ]
Das Sarma, S
机构
[1] Univ Calif Santa Barbara, Ctr Quantized Elect Struct, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Inst Theoret Phys, Santa Barbara, CA 93106 USA
[3] Univ Groningen, Dept Appl Phys, NL-9747 AG Groningen, Netherlands
[4] Univ Groningen, Ctr Mat Sci, NL-9747 AG Groningen, Netherlands
[5] Univ Maryland, Dept Phys, College Pk, MD 20742 USA
基金
美国国家科学基金会;
关键词
semiconductors; quantum wells; electron-electron interactions; electronic transport; quantum localization;
D O I
10.1016/S0038-1098(99)00024-1
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
We argue on the basis of experimental numbers that the B = 0 metal-insulator transition in two dimensions, observed in Si-MOSFETs and in other two-dimensional systems, is likely to be due to a few strongly interacting electrons, which also interact strongly with the random positively ionized impurities. At the insulating side the electrons are all bound in pairs to the ions. On the metallic side free electrons exist which are scattered by ions dressed with electron-pairs and therefore alter the bare scattering potential of the ions. The physics at the metallic side of the transition is argued to be controlled by the classical to quantum transport cross-over leading to the observed non-monotonous dependence of the resistivity on temperature. This few electrons per ion scenario appears to be an experimentally realistic and testable scenario, which can also serve as a starting point for further theoretical analysis of the two-dimensional metal-insulator transition. (C) 1999 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:581 / 586
页数:6
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