Imaging at High Spatial Resolution: Soft X-Ray Microscopy to 15 nm

被引：9

作者：

Attwood, David ^{[1
,2
]}

Chao, Weilun ^{[1
,2
]}

Anderson, Erik ^{[2
]}

Liddle, J. Alexander ^{[2
]}

Harteneck, Bruce ^{[2
]}

Fischer, Peter ^{[2
]}

Schneider, Gerd ^{[3
]}

Le Gros, Mark ^{[4
]}

Larabell, Carolyn ^{[4
,5
]}

机构：

[1] Univ Calif Berkeley, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[3] BESSY Synchrotron Facil, Berlin, Germany

[4] Univ Calif Berkeley, Lawrence Berkeley Lab, Natl Ctr Xray Tomog, Berkeley, CA 94720 USA

[5] Univ Calif San Francisco, Dept Anat, San Francisco, CA 94143 USA

来源：

JOURNAL OF BIOMEDICAL NANOTECHNOLOGY | 2006年 / 2卷 / 02期

关键词：

Soft X-Ray; Microscopy;

D O I：

10.1166/jbn.2006.011

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Soft X-ray microscopy has now achieved 15 nm spatial resolution with new zone plates and bending magnet radiation. Combined with elemental sensitivity and flexible sample environment (applied magnetic or electric fields, wet samples, windows, overcoatings) this emerges as a valuable tool for nanoscience and nanotechnology, complimenting common electron and scanning tip microscopies. In this presentation we describe recent advances in spatial resolution, expectations for the near future, and applications to magnetic materials, bio-tomography, etc.

引用

页码：75 / 78

页数：4

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