Soft 20-nm resolution x-ray microscopy demonstrated by use of multilayer test structures

被引：49

作者：

Chao, WL ^{[1
]}

Anderson, E

Denbeaux, GP

Harteneck, B

Liddle, JA

Olynick, DL

Pearson, AL

Salmassi, F

Song, CY

Attwood, DT

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA

[3] Univ Calif Berkeley, Natl Ctr Electron Microscopy, Berkeley, CA 94720 USA

来源：

OPTICS LETTERS | 2003年 / 28卷 / 21期

关键词：

D O I：

10.1364/OL.28.002019

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A spatial resolution of 20 nm is demonstrated at 2.07-nm wavelength by use of a soft x-ray microscope based on Fresnel zone plate lenses and partially coherent illumination. Nanostructural test patterns, formed by sputtered multilayer coatings and transmission electron microscopy thinning techniques, provide clear experimental results.

引用

页码：2019 / 2021

页数：3

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