A reproducible method to fabricate atomically sharp tips for scanning tunneling microscopy

被引：56

作者：

Nakamura, Y ^{[1
]}

Mera, Y ^{[1
]}

Maeda, K ^{[1
]}

机构：

[1] Univ Tokyo, Grad Sch Engn, Dept Appl Phys, Bunkyo Ku, Tokyo 1136856, Japan

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1999年 / 70卷 / 08期

关键词：

D O I：

10.1063/1.1149921

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The electrochemical etching method by Ibe [J. Vac. Sci. Technol. A 8, 3570 (1990)] to fabricate sharp tips for scanning tunneling microscopy was modified by shortening the cutoff time of the etching current after the material wire drops off at the air-electrolyte interface. The tip radius measured by field ion microscopy was successfully reduced to 8 nm when the cutoff time was shortened to 50 ns. The dependence of the field-emitting electron current from the sharpest tips was close to one expected from the Fowler-Nordheim formula with a reasonable value for the emitting area of the tip. (C) 1999 American Institute of Physics. [S0034-6748(99)01408-2].

引用

页码：3373 / 3376

页数：4

共 11 条

[1]

[Anonymous], REV SCI INSTRUM

[2] ELECTROCHEMICAL FABRICATION OF SCANNING-TUNNELING-MICROSCOPY TIPS WITHOUT AN ELECTRONIC SHUTOFF CONTROL [J].