MnAs/GaAs/MnAs:: Morphology and interfacial properties -: art. no. 035308

被引:13
作者
Garcia, V
Marangolo, M
Eddrief, M
Jaffrès, H
George, JM
Etgens, VH
机构
[1] Univ Paris 06, Inst NanoSci Paris, F-75015 Paris, France
[2] Univ Paris 07, CNRS, UMR 7588, F-75015 Paris, France
[3] Unite Mixte Phys CNRS Thales, F-91767 Palaiseau, France
[4] Univ Paris 11, F-91405 Orsay, France
关键词
D O I
10.1103/PhysRevB.73.035308
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The properties of epitaxial MnAs/GaAs/MnAs epilayers grown on GaAs(111)B substrates are investigated. The different steps of the growth are detailed from the buffer layer to the top MnAs layer using scanning tunneling microscopy. Despite the high quality of the bottom MnAs surface, uncovered regions of MnAs are observed when the low-temperature-grown GaAs overlayer thickness is 3 nm, while a continuous barrier is formed for an overlayer thickness of 7 nm. The interfacial electronic properties of GaAs/MnAs and MnAs/GaAs are examined with x-ray and ultraviolet photoemission spectroscopy, indicating an absence of detectable reactivity between GaAs and MnAs. Two monolayers of MnAs over GaAs are metallic with a bulk-like valence band. In addition, an n-type barrier height of 0.7 eV is estimated for MnAs/GaAs/MnAs.
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页数:8
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