Highly transparent and conductive ZnO-In2O3 thin films prepared by atmospheric pressure chemical vapor deposition

被引：15

作者：

Minami, T

Kumagai, H

Kakumu, T

Takata, S

Ishii, M

机构：

[1] Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1997年 / 15卷 / 03期

关键词：

D O I：

10.1116/1.580431

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Highly transparent and conductive ZnO-In2O3 films have been prepared by atmospheric pressure chemical vapor deposition using Zn(C5H7O2)(2), In(C5H7O2)(3), and H2O as Zn, In, and O source materials, respectively. The obtained minimum resistivity of polycrystalline In2O3 or ZnO films deposited on glass substrates at a temperature of 350 degrees C using In(C5H7O2)(3) Or Zn(C5H7O2)(2) and H2O, respectively, was 10(-2)-10(-1) Omega cm. The resistivity of ZnO-In2O3 films deposited at 350 degrees C was strongly dependent on the chemical composition (Zn content) of the films. A resistivity of 4x10(-4) Omega cm and an average transmittance above 85% in the visible range were obtained in an amorphous ZnO-In2O3 film with a Zn content (Zn/(In+Zn) atomic ratio) of 0.25. (C) 1997 American Vacuum Society.

引用

页码：1069 / 1073

页数：5

共 10 条

[1] Preparation of transparent and conductive In2O3-ZnO films by radio frequency magnetron sputtering [J].

Minami, T ;

Kakumu, T ;

Takata, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (03) :1704-1708

[2] New transparent conducting MgIn2O4-Zn2In2O5 thin films prepared by magnetron sputtering [J].

Minami, T ;

Takata, S ;

Kakumu, T ;

Sonohara, H .

THIN SOLID FILMS, 1995, 270 (1-2) :22-26

[3] HIGHLY TRANSPARENT AND CONDUCTIVE ZN2IN2O5 THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].

MINAMI, T ;

SONOHARA, H ;

KAKUMU, T ;

TAKATA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1995, 34 (8A) :L971-L974

[4] HIGHLY TRANSPARENT AND CONDUCTIVE ZINC-STANNATE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].

MINAMI, T ;

SONOHARA, H ;

TAKATA, S ;

SATO, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (12A) :L1693-L1696

[5] New multicomponent transparent conducting oxide films for transparent electrodes of flat panel displays [J].

Minami, T ;

Takata, S ;

Kakumu, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (03) :1689-1693

[6]

MINAMI T, 1996, THIN SOLID FILMS, V1, P290

[7] LOW-TEMPERATURE CONDUCTIVITY OF ZNO FILMS PREPARED BY CHEMICAL VAPOR-DEPOSITION [J].

NATSUME, Y ;

SAKATA, H ;

HIRAYAMA, T ;

YANAGIDA, H .

JOURNAL OF APPLIED PHYSICS, 1992, 72 (09) :4203-4207

[8]

OGAWA MF, 1990, J MATER SCI LETT, V72, P1351

[9] ZINC-INDIUM-OXIDE - A HIGH-CONDUCTIVITY TRANSPARENT CONDUCTING OXIDE [J].

PHILLIPS, JM ;

CAVA, RJ ;

THOMAS, GA ;

CARTER, SA ;

KWO, J ;

SIEGRIST, T ;

KRAJEWSKI, JJ ;

MARSHALL, JH ;

PECK, WF ;

RAPKINE, DH .

APPLIED PHYSICS LETTERS, 1995, 67 (15) :2246-2248

[10] TRANSPARENT CONDUCTING ZNO THIN-FILMS PREPARED ON LOW-TEMPERATURE SUBSTRATES BY CHEMICAL-VAPOR-DEPOSITION USING ZN(C5H7O2)2 [J].

SATO, H ;

MINAMI, T ;

MIYATA, T ;

TAKATA, S ;

ISHII, M .

THIN SOLID FILMS, 1994, 246 (1-2) :65-70

← 1 →