Preparation of transparent and conductive In2O3-ZnO films by radio frequency magnetron sputtering

被引:160
作者
Minami, T
Kakumu, T
Takata, S
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 03期
关键词
D O I
10.1116/1.580323
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Highly transparent and conductive In2O3-ZnO films have been prepared by rf magnetron sputtering using targets composed of In2O3 and ZnO. Polycrystalline Zn2In2O5 films were deposited at a substrate temperature of 350 degrees C using targets with a Zn content [Zn/(Zn+In)] of about 10-60 at. %. A uniform spatial resistivity distribution on the substrate surface was obtained even in Zn2In2O5 films deposited at room temperature. A resistivity of 3.4x10(-4) Ohm cm was obtained in Sn-doped Zn2In2O5 films deposited at 350 degrees C. A sheet resistance of 400 Ohm/sq and an average transmittance above 90% in the visible range were obtained for an undoped Zn2In2O5 him with a thickness of about 20 nm. The etching rate of In2O3-ZnO films when using HCl as the etchant could be controlled by the Zn content in the films. (C) 1996 American Vacuum Society.
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页码:1704 / 1708
页数:5
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