Nickel nanoparticles in silica glass fabricated by 60 keV negative-ion implantation

被引：44

作者：

Amekura, H

Kitazawa, H

Umeda, N

Takeda, Y

Kishimoto, N

机构：

[1] Natl Inst Mat Sci, Nanomat Lab, Tsukuba, Ibaraki 3050003, Japan

[2] Univ Tsukuba, Tsukuba, Ibaraki 3058573, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2004年 / 222卷 / 1-2期

关键词：

magnetic nanoparticle; ion implantation; superparamagnetism; enhancement of magnetic anisotropy; negative-ion; nickel; SiO2;

D O I：

10.1016/j.nimb.2004.01.214

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Magnetic nanoparticles are fabricated in silica glass (SiO2) using high-flux implantation of 60 keV negative nickel ions Ni-, Photo-absorption measurements and cross-sectional transmission electron microscopy (XTEM) observation confirm the formation of metallic Ni nanoparticles in SiO2, and exclude the possible formation of Ni silicides (Ni3Si, Ni2Si, NiSi) and oxides (NiO) as major products. The mean diameter of the nanoparticles was similar to2.9 nm, and the observed depth distribution was similar to a prediction from the TRIDYN code when sputtering was accounted for. Temperature- and field-dependences of magnetization show that the nanoparticles are in the superparamagnetic state at T >similar to 50 K. From the peak temperature of the zero-field cooling (ZFC) magnetization, which is similar to27 K, and the mean diameter determined from XTEM, it is suggested that the magnetic anisotropy constant K of the nanoparticles is enhanced by similar to8 times as compared to the bulk value. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：114 / 122

页数：9

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