Effect of nucleation layer on the magnetic properties of GaMnN

被引:26
作者
Thaler, G [1 ]
Frazier, R
Gila, B
Stapleton, J
Davidson, M
Abernathy, CR
Pearton, SJ
Segre, C
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] IIT, Phys Div Biol Chem & Phys Sci, Chicago, IL 60616 USA
关键词
D O I
10.1063/1.1695207
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effects of nucleation layer and growth temperature on the magnetic properties of GaMnN have been investigated. It was found that the largest magnetic moment was measured in films prepared on metalorganic chemical vapor deposition (MOCVD) GaN buffers at a growth temperature of 700 degreesC. Extended x ray absorption fine structure measurements indicate that the improved magnetic quality of the films grown on MOCVD layers versus gas source molecular beam epitaxy nucleation layers is not due to a change in the lattice position of the Mn and is more likely due to a reduction in defect density. Growth temperature was also found to have a significant impact on the magnetic properties, with the optimal growth temperature found to be 700 degreesC. (C) 2004 American Institute of Physics.
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收藏
页码:2578 / 2580
页数:3
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