Excimer laser assisted growth of Au thin films on mica (001)

被引：17

作者：

Polanski, G ^{[1
]}

Rubahn, HG ^{[1
]}

机构：

[1] MAX PLANCK INST STROMUNGSFORSCH,D-37073 GOTTINGEN,GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1996年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.579904

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Mica single crystal (001) surfaces are irradiated with light from an excimer laser (lambda=248 nm) and are analyzed via low-energy electron diffraction. It is shown that the excimer laser treatment makes them well suited for epitaxial growth of Au(lll) thin films (thickness 150-600 Angstrom). Further irradiation with the laser at reduced fluences improves the quality of the grown Au films significantly without the need for high-energy ion sputtering. (C) 1996 American Vacuum Society.

引用

页码：110 / 114

页数：5

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