High-rate dual-target dc magnetron sputter deposition of electrochromic MoO3 films

被引：28

作者：

Kharrazi, M

Azens, A

Kullman, L

Granqvist, CG

机构：

[1] Department of Materials Science, Uppsala University, S-751 21 Uppsala

来源：

THIN SOLID FILMS | 1997年 / 295卷 / 1-2期

关键词：

molybdenum oxide; optical properties; sputtering;

D O I：

10.1016/S0040-6090(96)09306-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Mo oxide films with good electrochromic properties were produced by single-target and dual-target reactive d.c. magnetron sputtering. Dual-target deposition was shown capable of yielding optically functional films at a rate similar to 20 times higher than that for single-target deposition, which is a result of considerable technical interest. (C) 1997 Elsevier Science S.A.

引用

页码：117 / 121

页数：5

共 39 条

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