Fluorine incorporated amorphous carbon thin films prepared by Surface Wave Microwave Plasma CVD

被引：12

作者：

Kalita, Golap ^{[1
]}

Aryal, Hare Ram ^{[1
]}

Adhikar, Sudip ^{[1
]}

Ghimire, Dilip C. ^{[1
]}

Afre, Rakesh A. ^{[2
]}

Soga, Tetsuo ^{[2
]}

Sharon, Maheshwar ^{[3
]}

Umeno, Masayoshi ^{[1
]}

机构：

[1] Chubu Univ, Dept Elect & Elect Engn, Kasugai, Aichi 4878501, Japan

[2] Nagoya Inst Technol, Dept Environm Technol & Urban Planning, Nagoya, Aichi 4668555, Japan

[3] Birla Coll, Nanotechnol Res Ctr, Kalyan 421304, India

来源：

关键词：

fluorinated amorphous carbon (a-C : F); Microwave Surface-Wave Plasma CVD; optical band gap; X-ray photoelectron spectroscopy;

D O I：

10.1016/j.diamond.2008.02.002

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Fluorine incorporated amorphous carbon (a-C:F) thin films were prepared by Microwave Surface Wave Plasma chemical vapour deposition (MW SWP CVD) using a mixture of carbon tetrafluoride (CF4) and acetylene (C2H2) gas along with argon (Ar) as dilution gas. Optical properties studied by ultraviolet-visible spectroscopy shows an increase in optical band gap with respect to CF4/C2H2 flow rate ratio. Fourier transforms infrared spectroscopy (FTIR) Studies show formation of C-F bonding configuration with high fluorine incorporation. X-ray photoelectron spectroscopy (XPS) shows carbon peaks shifted to higher binding energy levels due to carbon fluorine linking. CFx bonding configuration enhanced with more and more fluorine incorporation. Raman studies of the films show structural transition with fluorine incorporation. From these studies correlation of optical properties, bonding configuration and structural properties of fluorinated carbon thin films were discussed. (c) 2008 Elsevier B.V. All rights reserved.

引用

页码：1697 / 1701

页数：5

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