Embossed polymeric relief structures as a template for the growth of periodic inorganic microstructures

被引:27
作者
Dick, B [1 ]
Sit, JC
Brett, MJ
Votte, IMN
Bastiaansen, CWM
机构
[1] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2G7, Canada
[2] Eindhoven Univ Technol, Dept Chem Engn, NL-5600 MB Eindhoven, Netherlands
关键词
D O I
10.1021/nl0055153
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
A new method is presented for the glancing angle deposition (GLAD) of inorganic micro- and nanostructures using polymeric relief structures as seeding sites. Conventional embossing processes in thermoset resins are used to produce the relief structures, which potentially facilitates large scale production array production. By utilizing GLAD to control the film deposition conditions over these arrays, we have fabricated periodic lattices (2 mum periodicity) of both silicon dioxide pillars with a thickness of 1.58 mum and oblique nickel columns of thickness 0.60 mum.
引用
收藏
页码:71 / 73
页数:3
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