Photonic-crystal near-ultraviolet reflectance filters fabricated by nanoreplica molding - art. no. 071110

被引:50
作者
Ganesh, N [1 ]
Cunningham, BT [1 ]
机构
[1] Univ Illinois, Nano Sensors Grp, Micro & Nanotechnol Lab, Urbana, IL 61801 USA
基金
美国国家科学基金会;
关键词
Optical filters;
D O I
10.1063/1.2173718
中图分类号
O59 [应用物理学];
学科分类号
摘要
One-dimensional photonic-crystal reflectance filters operating in the near-ultraviolet wavelengths were fabricated using nanoreplica molding from a silicon surface structure "master" template, patterned using electron-beam lithography. The fabricated devices produce a narrow linewidth reflectance resonance at a wavelength of 411 nm for TM polarized illumination and a broadband reflectance characteristic between 402 and 439 nm for TE polarized illumination. The measured reflectance spectra are accurately predicted by Rigorous Coupled Wave Analysis computer simulations, which demonstrate the capability for designing similar filter performance for wavelengths < 350 nm through minor adjustment of the photonic-crystal lattice period.
引用
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页数:3
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