Atomic Layer Deposition of LiOH and Li2CO3 Using Lithium t-butoxide as the Lithium Source

被引：58

作者：

Cavanagh, A. S. ^{[1
,2
]}

Lee, Y. ^{[3
]}

Yoon, B. ^{[3
]}

George, S. M. ^{[3
,4
]}

机构：

[1] Univ Colorado, Dept Phys, Boulder, CO 80309 USA

[2] Univ Colorado, DARPA Ctr Integrated Micro Nano Elect Transducers, Boulder, CO 80309 USA

[3] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA

[4] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA

来源：

ATOMIC LAYER DEPOSITION APPLICATIONS 6 | 2010年 / 33卷 / 02期

关键词：

ELECTROLYTE-SOLUTIONS; GRAPHITE-ELECTRODES; BATTERIES; ETHYLENE; FILMS;

D O I：

10.1149/1.3485259

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Atomic layer deposition (ALD) was utilized to grow LiOH and Li2CO3 films using lithium tert-butoxide, H2O and CO2. Film growth was monitored with a quartz crystal microbalance at 225 degrees C. LiOH ALD had a growth rate of 12.7 ng.cm(-2).cycle(-1) before displaying evidence for hygroscopic behavior. Li2CO3 ALD had a growth rate of 17.1 ng.cm(-2).cycle(-1). The film identities were confirmed using Fourier transform infrared and X-ray photoelectron spectroscopies. Lithium-containing films are present in the solid-electrolyte interphase (SEI) on graphite anodes of Li-ion batteries. The ALD of an artificial SEI layer may limit lithium loss and improve the capacity stability during charge-discharge cycles.

引用

页码：223 / 229

页数：7

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