Hollow cathode plasma sources for large area surface treatment

被引：57

作者：

Baránková, H ^{[1
]}

Bárdos, L ^{[1
]}

机构：

[1] Univ Uppsala, Angstrom Lab, S-75121 Uppsala, Sweden

来源：

SURFACE & COATINGS TECHNOLOGY | 2001年 / 146卷

关键词：

hollow cathode; atmospheric plasma; oxide and nitride films; plasma cleaning and activation;

D O I：

10.1016/S0257-8972(01)01376-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Plasma generation over large areas using a hollow cathode discharge is described in this study. Radio frequency linear hollow cathodes in several arrangements, for operation at reduced gas pressure and suitable for scale-up, are presented. Examples of surface processing and coating by PVD, both by hollow cathode discharge (HCD) and hollow cathode arc (FICA). are given. A non-equilibrium atmospheric plasma source utilizing a fused hollow cathode WHO with its modular concept can be used for surface treatment, activation or cleaning of temperature sensitive materials at ambient atmosphere. Results on polyethylene and polyethyleneterephtalate activation are presented. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：486 / 490

页数：5

共 19 条

[1] METASTABLE ASSISTED DEPOSITION OF TIN FILMS [J].