Single pulse nm-size grating formation in polymers using laser ablation with an irradiation wavelength of 355 nm

被引：38

作者：

Lippert, T ^{[1
]}

Gerber, T

Wokaun, A

Funk, DJ

Fukumura, H

Goto, M

机构：

[1] Paul Scherrer Inst, CH-5232 Villigen, Switzerland

[2] Los Alamos Natl Lab, Los Alamos, NM 87545 USA

[3] Japan Atom Energy Res Inst, Adv Sci Res Ctr, Neyagawa, Osaka 572, Japan

[4] Tohoku Univ, Dept Chem, Sendai, Miyagi 9808578, Japan

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 07期

关键词：

D O I：

10.1063/1.124584

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Laser ablation at 355 nm of a specially designed polymer was used as a true single step dry-etching process to create a two-beam interference grating. Gratings with groove spacings of 180 and 1090 nm were created with single laser pulses. Moreover, by varying the laser fluence and/or the angle between the two beams, variable modulation frequencies (depth/spacing) could be obtained. Additional pulses deteriorated the grating quality, demonstrating the importance of the single pulse approach. (C) 1999 American Institute of Physics. [S0003-6951(99)00333-2].

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页码：1018 / 1020

页数：3

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