Interfaces of correlated electron systems: Proposed mechanism for colossal electroresistance

被引:122
作者
Oka, T
Nagaosa, N
机构
[1] Natl Inst Adv Ind Sci & Technol, AIST, CERC, Tsukuba, Ibaraki 3058562, Japan
[2] Univ Tokyo, Dept Appl Phys, Bunkyo Ku, Tokyo 1138656, Japan
关键词
D O I
10.1103/PhysRevLett.95.266403
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Mott's metal-insulator transition at an interface due to band bending is studied by the density matrix renormalization group approach. We show that the result can be recovered by a simple modification of the conventional Poisson's equation approach used in semiconductor heterojunctions. A novel mechanism of colossal electroresistance is proposed, which incorporates the hysteretic behavior of the transition in higher dimensions.
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页码:1 / 4
页数:4
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