Propagation of the magnetic domain wall in submicron magnetic wire investigated by using giant magnetoresistance effect

被引：17

作者：

Ono, T ^{[1
]}

Miyajima, H

Shigeto, K

Mibu, K

Hosoito, N

Shinjo, T

机构：

[1] Keio Univ, Fac Sci & Technol, Yokohama, Kanagawa 2238522, Japan

[2] Kyoto Univ, Inst Chem Res, Uji, Kyoto 6110011, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 85卷 / 08期

关键词：

D O I：

10.1063/1.370214

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The magnetization reversal phenomenon in a submicron magnetic wire with a trilayer structure consisting of NiFe(400 Angstrom)/Cu(200 Angstrom)/NiFe(50 Angstrom) was investigated by measuring the electric resistance in external magnetic fields. It is shown that the magnetization reversal can be very sensitively investigated by utilizing the giant magnetoresistance effect. The time variation of resistance during the magnetization reversal was also measured and the velocity of the magnetic domain wall propagating in the wire was determined at 77 K. (C) 1999 American Institute of Physics. [S0021-8979(99)69808-5].

引用

页码：6181 / 6183

页数：3

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