Electronic structure of oxygen deficient amorphous oxide semiconductor a-InGaZnO4-x:: Optical analyses and first-principle calculations

被引:220
作者
Kamiya, Toshio [1 ]
Nomura, Kenji [2 ]
Hirano, Masahiro [2 ,3 ]
Hosono, Hideo [1 ,2 ,3 ]
机构
[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, 4259 Nagatsuta, Yokohama, Kanagawa 2268503, Japan
[2] Japan Sci & Technol Agency, ERATO SORST, Kawaguchi, Saitama, Japan
[3] Tokyo Inst Technol, Frontier Collaborative Res Ctr, Yokohama, Kanagawa 2268503, Japan
来源
PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 5, NO 9 | 2008年 / 5卷 / 09期
关键词
D O I
10.1002/pssc.200779300
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Defect states in a representative amorphous oxide semiconductor, a-InGaZnO4, were studied by optical analyses and first-principle calculations. The optical analyses suggested that the as-deposited a-IGZO film have weak subgap absorptions around 0.6 and 2 eV. Local density approximation calculations showed that an oxygen defect works as an electron trap as well as a shallow donor depending on its local structure. It suggests that a large vacancy space remained in an oxygen deficient structure forms a deep levels in the band gap and traps electrons, while if such a large space is annihilated e.g. by a film growth process and post thermal annealing, oxygen deficiency may form a shallow donor level. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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页码:3098 / +
页数:2
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