Perpendicular lamellae induced at the interface of neutral self-assembled monolayers in thin diblock copolymer films

被引：57

作者：

Sohn, BH ^{[1
]}

Yun, SH ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Polymer Res Inst, Dept Mat Sci & Engn, Pohang 790784, South Korea

来源：

POLYMER | 2002年 / 43卷 / 08期

关键词：

block copolymer; thin film; self-assembled monolayer;

D O I：

10.1016/S0032-3861(02)00049-6

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

We obtained perpendicular lamellar orientations in thin films of symmetric polystyrene-block-poly(methyl methacrylate), PS-b-PMMA, on self-assembled monolayers (SAMs) of 3-(p-methoxyphenyl)propyltrichlorosilane (MPTS) prepared on silicon wafers. In contrast to completely parallel lamellae on silicon wafers having a native oxide layer, perpendicular lamellae at the MPTS interface with parallel lamellae at the air interface were directly observed by transmission electron microscopy (TEM) in cross-sectional view. The perpendicular lamellae at the MPTS interface were attributed to the non-preferential (neutral) MPTS-covered substrate to both PS and PMMA blocks. The neutrality of the SAMs of MPTS was confirmed by the similar interfacial tension values of the SAMs of MPTS with PS and PMMA, estimated by contact angle measurements. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：2507 / 2512

页数：6

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