Synthesis and applications of sulfonated polyaniline

被引:126
作者
Shimizu, S
Saitoh, T
Uzawa, M
Yuasa, M
Yano, K
Maruyama, T
Watanabe, K
机构
[1] FUJITSU LABS LTD,ATSUGI,KANAGAWA 23401,JAPAN
[2] FUJITSU LTD,NAKAHARA KU,KAWASAKI,KANAGAWA 211,JAPAN
关键词
polyaniline and derivatives; ab initio quantum chemical methods and calculations; e-beam lithography;
D O I
10.1016/S0379-6779(97)80260-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We present new synthesis and applications of fully-sulfonated polyaniline(SPAN), a self-doped conducting polymer. It is difficult to make polymers of aniline sulfonic acids(ASA) with a high molecular weight, since reactivity of ASA as a monomer is low due to the presence of an electron attractive sulfonic group. We prepared a high molecular weight poly(aniline sulfonic acid)(PAS) with a high yield by polymerizing the ASA having an electron donative group under basic conditions. conducting polymer materials based on this polymer were developed for a variety of applications including; 1) Over Coated Film for Resists (aquaSAVE(R)) - Charge prevention for e-beam lithography and improvement of post-exposure delay(PED) latitude for Chemical amplified resists. 2) Conductive Bottom Layers of Multi level Resists - Reduction of gate oxide damage in metal etching, etc.
引用
收藏
页码:1337 / 1338
页数:2
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