Characterization of porous aluminum oxide films by metal electrodeposition

被引：23

作者：

Serebrennikova, I

Vanysek, P

Birss, VI

机构：

[1] UNIV CALGARY,DEPT CHEM,CALGARY,AB T2N 1N4,CANADA

[2] NO ILLINOIS UNIV,DEPT CHEM,DE KALB,IL 60115

来源：

ELECTROCHIMICA ACTA | 1997年 / 42卷 / 01期

基金：

加拿大自然科学与工程研究理事会;

关键词：

aluminum oxide; pore; porous; electrodeposition;

D O I：

10.1016/0013-4686(96)00184-3

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

It is well known that porous (with underlying compact oxide) aluminum oxide films of varying pore size and diameter can be formed electrochemically on the surface of aluminum, depending on the oxidation conditions employed. In the present work, the properties of various porous Al oxide films were compared in terms of their electrochemical responses during silver electrodeposition. The cyclic voltammetric and current-time responses during silver deposition show an increased rate in the following sequence: sulfuric acid grown films (smallest pores), phosphoric acid grown (larger pores) and barrier oxide films (no pores), under identical applied voltages. Thicker porous oxide films formed after longer times of anodizing show lower deposition currents, while films formed at higher voltages (expected to yield larger diameter pores) result in higher silver deposition currents. Copyright (C) 1996 Elsevier Science Ltd

引用

页码：145 / 151

页数：7

共 25 条

[21] TRANSPARENT METAL MICROSTRUCTURES [J].