Fundamental transport properties in N-phenyl thin films

被引:21
作者
Tkaczyk, SW
Kityk, IV
Schiffer, R
机构
[1] Inst Phys WSP, PL-42201 Czestochowa, Poland
[2] Tech Univ Vienna, Informat Engn Chair, A-12791 Vienna, Austria
关键词
D O I
10.1088/0022-3727/35/6/311
中图分类号
O59 [应用物理学];
学科分类号
摘要
Conductivity of N-phenyl (N = 3, 4) thin films (with thickness 2-15 mum) was investigated experimentally and theoretically using molecular dynamics simulations of microcrystallite (MC) occurrence and quantum chemical band structure calculations. At the first time, process of carrier kinetics is considered within a framework of self-consistent band structure approach. The external electric field was varied up to 10(6) V cm(-1) using Al-Au electrodes with different voltage polarities. Depending on the film thickness and N, we have discovered the appearance of minima of effective activation energy. The observed effects are explained as a competition between the diffusion recombination of carriers from the trapping MC levels and the potential gradients on the MC surfaces. A good agreement between the performed theoretical simulations and experimental data is achieved.
引用
收藏
页码:563 / 569
页数:7
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