Stationary carbon cathodic arc: Plasma and film characterization

被引：42

作者：

Chhowalla, M

Davis, CA

Weiler, M

Kleinsorge, B

Amaratunga, GAJ

机构：

[1] University of Cambridge, Department of Engineering, Cambridge CB2 1PZ, Trumpington Street

[2] University of Cambridge, Dept. of Mat. Science and Metallurgy, Cambridge CB2 3QZ, Pembroke Street

[3] Forschungszentrum Rossendorf, Inst. F. Ionenstrahl M., D-01314 Dresden

[4] University of Liverpool, Dept. of Electrical Engineering

来源：

JOURNAL OF APPLIED PHYSICS | 1996年 / 79卷 / 05期

关键词：

D O I：

10.1063/1.362656

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The plasma characteristics of a new are mode on carbon referred to as the ''stationary cathodic arc'' are reported. Particularly, optical emission spectroscopy, probe and ion energy distribution measurements are used to compare the properties of the stationary are with the normal ''random cathodic arc'' on carbon. The measurements revealed that the plasma properties of both are modes are similar. In addition, we have correlated the plasma characteristics to the film properties. Carbon films deposited using the stationary are were found to have a surface particle density equivalent to those deposited using the filtered cathodic vacuum are. The macro-particle free films were found to be highly tetrahedral and compressively stressed. Both the sp(3) fraction and stress values were strongly dependent on the ion energy with maximum values of 85% and 9.4 Gpa, respectively, occurring at approximate to 50 eV. (C) 1996 American Institute of Physics.

引用

页码：2237 / 2244

页数：8

共 39 条

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