Understanding correlations between chemical and magnetic interfacial roughness

被引：22

作者：

Freeland, JW

Bussmann, K

Idzerda, YU

Kao, CC

机构：

[1] Argonne Natl Lab, Expt Facil Div, Argonne, IL 60439 USA

[2] USN, Res Lab, Div Mat Sci, Washington, DC 20375 USA

[3] Brookhaven Natl Lab, Natl Synchrotron Light Source Dept, Upton, NY 11973 USA

来源：

PHYSICAL REVIEW B | 1999年 / 60卷 / 14期

关键词：

D O I：

10.1103/PhysRevB.60.R9923

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

By studying the variation in magnetic interfacial structure using diffuse x-ray resonant magnetic scattering, underlying connections between the chemical and magnetic interfaces are uncovered and utilized to understand how intrinsic magnetic properties influence the behavior of magnetic interface. By considering the effect of competing magnetic energies (dipolar, anisotropy, and exchange) at the rough interface, it becomes clear how magnetic forces can lead to a reduction of the magnetic interfacial disorder. [S0163-1829(99)51638-X].

引用

收藏

页码：R9923 / R9926

页数：4

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