Nanocoating individual silica nanoparticles by atomic layer deposition in a fluidized bed reactor

被引：110

作者：

Hakim, LF ^{[1
]}

Blackson, J

George, SM

Weimer, AW

机构：

[1] Univ Colorado, Dept Chem & Biol Engn, Boulder, CO 80309 USA

[2] Dow Chem Co USA, Analyt Lab, Midland, MI 48674 USA

[3] Univ Colorado, Dept Chem & Biochem, Boulder, CO 80309 USA

来源：

CHEMICAL VAPOR DEPOSITION | 2005年 / 11卷 / 10期

关键词：

atomic layer deposition; conformal coating; fluidization; nanoparticles; ultrathin films;

D O I：

10.1002/cvde.200506392

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Silica nanoparticles (40 nm) were individually and conformally coated with alumina films using atomic layer deposition (ALD) in a fluidized bed reactor. Films were deposited using self-limiting sequential surface reactions of trimethylaluminum and water. Alumina vibrational modes were observed using Fourier-transform infrared spectroscopy (FTIR). X-ray photoelectron spectroscopy (XPS) indicated complete coverage on the surface as the silica features were completely attenuated. Scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) showed high uniformity of the deposited films. Transmission electron microscopy (TEM) revealed extremely conformal films with an average growth rate of 0.11 nm per cycle. Self-limiting characteristics of ALD allowed primary nanoparticles to be coated as they fluidized as dynamic aggregates.

引用

页码：420 / 425

页数：6

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